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Oxide
Manufacture High purity 99.99% AZO target for sputtering
Manufacture High purity ITO target (In2O3:SnO2=90:10(wt%)) for sputtering
Chromium Oxide Sputtering Targets 99.99% Cr2O3 target
Indium Tin Oxide Sputtering Targets ITO target (In2O3:SnO2=90:10 wt%)
Sputtering SnO2 target Undoped SnO2 sputtering deposition
CuO sputtering target 99.99% Pure Copper Oxide target coating 4N
Pure al2o3 sputtering target al2o3 sputtering deposition
ITO target/In2O3:SnO2=90:10wt%/ITO Planar sputtering target
4N Niobium oxide sputtering deposition Pure Nb2O5 99.99
Copper oxide target 99.99 Pure CuO target
alumina sputtering target Pure alumina
Undoped al2o3 99.99 Al2O3 sputtering deposition
High purity TiO2 target 4N 4N TiO2 99.99%
High purity Indium tin oxide 4N High purity ITO Target 99.99%
High purity Al2O3 target 4N 99.99% Al2O3 target
High purity niobium oxide 4N High purity Nb2O5 99.99%
5N ZnO solar cells Undoped ZnO target for solar cells
evaporation material Oxide Carbide Nitride Boride Antimonide Silicide
High purity alumina target
Aluminum Oxide Sputtering Targets 99.99% Al2O3 target
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