Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

High purity Aluminum Silicon sputtering target 99.99% High purity Al-Si Target

Basic Information
Product Description

Item Name

High purity Aluminum Silicon sputtering target 99.99% High purity Al-Si Target (Al:Si=99:1(wt%))

Purity

99.995% ,99.999%,99.9995%

Shape

Square/Round, According to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Vacuum Melting, Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Solar Photovoltaic Appication.

B: Electronic and Semiconductor Appication.

C: Decoration and Coating Appication. etc.
    silicon target  5N or 6N Type: Single crystal Si target and Poly crystal Si target Purity:     Si:99.999%, min and 99.9999% min. Resistivity: 0.02ohm·cm max. ,0.02ohm·cm max.or 0.5-5 ohm·cm Size:       Length:300mm max., Width:125mm max., Thickness: 2mm-20mm
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]

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