Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

4N alumina sputtering target for sputtering deposition

Basic Information
Specifications 4N alumina sputtering target for sputtering deposition

1. High density:95%

2. Low impurity content

Al2O3 target Supply 4N alumina sputtering target for sputtering deposition Product Description     

Item Name

Pure alumina sputtering target 4N alumina sputtering deposition

Purity

99.99%

Shape

Square /round, according to your request

Available size

Round: dia 25~250mm

Rectangular: length up to 1500mm

Customization is available

Impurity content

Low

Certificates

ISO9001:2008, SGS, the third test report

Technics

Hot pressed sintering

Application

Widely used in coating processing industries such as

optics, solar photovoltaic, IC and electronic electronics, solar cells,

architectural and automotive glass coating and so on. 

Advantage

High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength 

     
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
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