Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

Titanium Carbide sputtering target 99.99% TiC target for film coating

Basic Information
Specifications Titanium Carbide sputtering target 99.99% TiC target for film coating

1. High density: 99%

2. Low impurity content

Item Name

Titanium Carbide sputtering target 99.99% TiC target for film coating

Purity

99.99%

Shape

Square /round, according to your request

Available size

Round: dia 25~250mm

Rectangular: length up to 1500mm

Customization is available

Impurity content

low

Certificates

ISO9001:2008, SGS, the third test report

Technics

Powder metallurgy

Application

widely used in coating processing industries

a: Titanium carbide coating tools .

b:electronic and semiconductor field.

c:decoration and mould field.  

Advantage

High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength 

 
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
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