Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

High purity Aluminum oxide target 99.99% 4N aluminum oxide sputtering target

Basic Information
Specifications High purity Aluminum oxide target 99.99% 4N aluminum oxide sputtering target

1. High density:>95%

2. Low impurity content

Item Name

High purity Aluminum oxide (Al2O3) target

Purity

99.99%

Shape

Square /round, according to your request

Available size

Round: dia 25~300mm

Rectangular: length up to 1500mm

Customization is available

Impurity content

Low

Certificates

ISO9001:2008, SGS, the third test report

Technics

Powder metallurgy , Vacutln Sintering/HIP

Application

Widely used in coating processing industries such as

optics, solar photovoltaic, IC and electronic electronics, solar cells,

architectural and automotive glass coating and so on. 

Advantage

High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength 

 
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
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