Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

High purity Silicon carbide target 99.9% Silicon carbide sputtering target 3N

Basic Information
Specifications High purity Silicon carbide target 99.9% Silicon carbide sputtering target 3N

1. High density: 99%

2. Low impurity content

Item Name

High purity Silicon carbide target 99.9% Silicon carbide sputtering target 3N

Purity

99.9%

Shape

Square /round, according to your request

Available size

Round: dia 25~300mm

Rectangular: length up to 1500mm

Customization is available

Impurity content

Low

Certificates

ISO9001:2008, SGS, the third test report

Technics

Powder metallurgy, Vacutln Sintering/HIP

Application

Widely used  in coating processing industries

a: architectural glass, car using glass, graphic display field.

b:electronic and semiconductor field.

c:decoration and mould field.  

d:optics coating materials  

Advantage

High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength 

   
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
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