Item Name | Silicon dioxide target 99.99% silicon dioxide sputtering target |
Purity | 99.99% |
Shape | Square /round, according to your request |
Available size | Round: dia 25~300mm Rectangular: length up to 1500mm Customization is available |
Impurity content | Low |
Certificates | ISO9001:2008, SGS, the third test report |
Technics | Powder metallurgy, Vacutln Sintering/HIP |
Application | Widely used in coating processing industries such as optical data storage, solar photovoltaic, IC and electronic electronics, solar cells, flat panel display industry and so on. |
Advantage | High Hard texture Low impurity content Better heat dissipation High Tensile strength |