Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

Silicon dioxide target 99.99% silicon dioxide sputtering target

Basic Information
Specifications Silicon dioxide target 99.99% silicon dioxide sputtering target

1. High density:99%

2. Low impurity content

Item Name

Silicon dioxide target 99.99% silicon dioxide sputtering target

Purity

99.99%

Shape

Square /round, according to your request

Available size

Round: dia 25~300mm

Rectangular: length up to 1500mm

Customization is available

Impurity content

Low

Certificates

ISO9001:2008, SGS, the third test report

Technics

Powder metallurgy, Vacutln Sintering/HIP

Application

Widely used in coating processing industries such as

optical data storage, solar photovoltaic, IC and electronic electronics, solar cells, flat panel display industry and so on. 

Advantage

High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength 

 
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
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