Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

TiO2 Sputtering Target 99.99% Pure TiO2 target 99.99

Basic Information
Specifications TiO2 Sputtering Target 99.99% Pure TiO2 target 99.99

1. High density: 99%

2. Low impurity content

3. Microstructure: Uniform

Item Name

TiO2 Sputtering Target 99.99% Pure TiO2 target 99.99

Shape

Square/Round, according to your request

Available size

Round: dia 25~250mm

Rectangular: length up to 1500mm

Customization is available

Certificates

ISO9001:2008,SGS,the third test report

Impurity content

Low

Technics

Powder metallurgy

Application

 

Widely used in coating processing industries such as optics, photonics, nanometer materials , PDP, touch panel industry, solar cells, solar photovoltaic application ,decoration and other kind of scientific researches and industrial production fields

Advantage

High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength

 
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
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