Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

Manufacture High Purity 99.95% 50.8*3mm Co Target

Basic Information
  Manufacture High Purity 99.95% 50.8*3mm  Co Target     Product Description

Item Name

 Manufacture High Purity 99.95% 50.8*3mm  Co Target

Purity

99.99%

Shape

Flat/rotary target, according to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Vacuum Melting, Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Magnetic Data Storage Application

 

Quality Standard (99.99% Co)

Element

Value(<ppb)

Element

Value(<ppb)

Mg

0.2

Cu

2000

Al

1

Zn

50

Si

10

As

100

P

4

Cd

50

S

450

Sn

20

Mn

1

Sb

5

Fe

5000

Pb

500

Ni

3000

Bi

1

      Product Picture     Cobalt sputtering target
1. Processing technology: vacuum smelting
2. The density: high
3. Purity: 99.95%
4. Specific dimension and the quantity component can be supplied as per customer's requirements. Certifications
    Specifications Cobalt sputtering target 
High quality: Purity 4N-5N 
Custom service: Flexible in Dia and Thickness 
Fast deliver: Professional Company Information Zhongnuo Advanced Material (Beijing) Technology Co., Ltd. is a high-tech enterprise specialized in the production of high-purity metal, evaporation coating materials, and sputtering targets. "Professional, high quality and high efficiency" is our company's operation philosophy. Depending on high-quality products, professional services and a good business reputation, our company is a designated material supplier for many enterprises and scientific research institutes.   Our Main Products: 
High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and Evaporation material. 
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5 
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR 
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X   Our team     Advantage: Our Sputtering  targets provide customers with outstanding high-volume production capability combined with low operating costs required for today’s advanced chips.   Our Custom service:  We offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for you.   Hot Products   Our company is a production of high purity product, like Ni, Cu, Al, Ti ect.  If you have any needs, please contact us.
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
More > Other products from this company
Post Buying Request