High purity Hafnium target 3N5 Hf target 99.95 Hafnium sputtering targets 99.99% 4N Hf target Product Description Hf sputtering target: Regular Size: Round: dia 25~350mm,Thickness:3~4000mm Rectangular: Length up to 1500mm Zhongnuo Hf target Customization is available Purity :99.95%, 99.99% 1.Supply Ability:to be produced as order 2.Good quality of goods,Competitive price 3.Fast feedback on your inquiries. 4.Trial order is acceptable before bulk ordering.
Item Name | High purity Hafnium (Hf) target Hafnium sputtering targets 99.99% 4N Hf target |
Purity | 99.95% ,99.99% |
Shape | Square /round, according to your request |
Available size | Round: dia 25~250mm Rectangular: length up to 1500mm Customization is available |
Impurity content | lower than 100ppm |
Certificates | ISO9001:2008, SGS, the third test report |
Technics | Vacuum melting |
Application | widely used in coating processing industries a: architectural glass, car using glass, graphic display field. b:electronic and semiconductor field. c:decoration and mould field. d:optics coating materials |
Advantage | High Hard texture Low impurity content Better heat dissipation High Tensile strength Hafnium has high melting point and coexist with zirconium, used as cathode of X-ray tube. Hafnium tungsten or hafnium molybdenum alloy is used as electrodes of high-pressure discharge tube. Hafnium can be used as getter of many inflation systems. The hafnium getter can remove oxygen, nitrogen and other needless gases existing in the system. Hafnium is also used for nuclear reactor control rods.
|
Our Services Advantage: Zhongnuo Sputtering targets provide customers with outstanding high-volume production capability combined with low operating costs required for today’s advanced chips. Microstructure:Uniform equiaxed fine grain,consistent microstructure,average grain size <50μm Technics: Zhongnuo Vacuum Melting, Patented thermo-mechanical process and machine work.
Our Custom service: Zhongnuo offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for you.
Quality: Microstructure Performance
Quality Standard (99.95% Hf) |
Element | Valu(<Ppm) | Element | Valu(<Ppm) | Element | Valu(<Ppm) |
Al | 25 | Mg | 2 | Si | 25 |
B | 0.5 | Mn | 20 | Ta | 1 |
Bi | 1 | Mo | 10 | Ti | 20 |
C | 20 | N | 5 | U | 2 |
Cd | 2.5 | Nb | 50 | W | 20 |
Cr | 30 | Ni | 25 | Zr | 0.1 |
Co | 5 | O | 50 | | |
Fe | 95 | P | 10 | | |
| | | | | | |
Electronic semiconductor, Recording media, Graphic display, Glass coating, Solar battery. Zhongnuo Hafnium Hf target is widely used in coating processing industries A: Solar Photovoltaic Application. B: Electronic and Semiconductor Application. C: Decoration and Coating Application. etc. D:Magnetic Data Storage Application. Material Classification: Zhongnuo provides Metal, Metal Oxides, Fluoride, Mixture, Other compound etc.
Product | Sign | Purity | Form | Spec |
High purity Hafnium
Znongnuo | Hf | 3N5, 4N | Sputtering targets | 50.8*5mm etc |
3N5, 4N | Rod | Dia2*5mm |
3N5, 4N | Wire | Dia0.1-Dia5mm |
3N5, 4N | Sheet | 0.03-10mm thickness |
3N5, 4N | Granules | 1-5mm |
3N5, 4N | Powder | -200mesh etc |
Company Information Zhongnuo is a manufacture dealing with high purity metals, good quality and high purity is always our advantage. Zhongnuo specilizes in manufacture for all kinds of pure metals, evaporation sources and sputtering targets for use in both thermal and E-beam evaporation as well as sputter deposition processes. We offer pure elements, compounds, alloys, ceramics in a variety of shapes, sizes and purities for R&D applications. In addition, our sputter target bonding and precious metals reclamation services save our customers time and money. Customers can access MSDS and Material Certification Sheets from us for all materials. We are always ensuring your standards are met by meeting our own quality demands. High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and Evaporation material.
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X