High purity Hafnium target 3N5 Hf target 99.95 High Purity Hf target 99.95%   Product Description    Hf sputtering target:   Regular Size: Round: dia 25~350mm,Thickness:3~4000mm   Rectangular: Length up to 1500mm   Zhongnuo Hf target Customization is available   Purity :99.95%, 99.99%     1.Supply Ability:to be produced as order   2.Good quality of goods,Competitive price   3.Fast feedback on your inquiries.   4.Trial order is acceptable before bulk ordering.  

Item Name	High purity Hafnium  (Hf) target High Purity Hf target 99.95%
Purity	99.95% ,99.99%
Shape	Square /round, according to your request
Available size	Round: dia 25~250mm Rectangular: length up to 1500mm Customization is available
Impurity content	lower than 100ppm
Certificates	ISO9001:2008, SGS, the third test report
Technics	Vacuum melting
Application	widely used in coating processing industries a: architectural glass, car using glass, graphic display field. b:electronic and semiconductor field. c:decoration and mould field.   d:optics coating materials
Advantage	High Hard texture Low impurity content Better heat dissipation High Tensile strength    Hafnium has high melting point and coexist with zirconium, used as cathode of X-ray tube. Hafnium tungsten or hafnium molybdenum alloy is used as electrodes of high-pressure discharge tube. Hafnium can be used as getter of many inflation systems. The hafnium getter can remove oxygen, nitrogen and other needless gases existing in the system. Hafnium is also used for nuclear reactor control rods.

      

    Our Services      Advantage:    Zhongnuo Sputtering  targets provide customers with outstanding high-volume production capability combined with low operating costs required for today’s advanced chips.   Microstructure:Uniform equiaxed fine grain,consistent microstructure,average grain size <50μm   Technics:  Zhongnuo Vacuum Melting, Patented thermo-mechanical process and machine work.      Our Custom service:     Zhongnuo offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for you.  
   Quality:         Microstructure                                                                  Performance       

Quality Standard (99.95% Hf)
Element	Valu(<Ppm)		Element	Valu(<Ppm)	Element	Valu(<Ppm)
Al	25		Mg	2	Si	25
B	0.5		Mn	20	Ta	1
Bi	1		Mo	10	Ti	20
C	20		N	5	U	2
Cd	2.5		Nb	50	W	20
Cr	30		Ni	25	Zr	0.1
Co	5		O	50
Fe	95		P	10

  Electronic semiconductor, Recording media, Graphic display, Glass coating, Solar battery.   Zhongnuo Hafnium Hf target is widely used in coating processing industries   A: Solar Photovoltaic Application.   B: Electronic and Semiconductor Application.   C: Decoration and Coating Application. etc.   D:Magnetic Data Storage Application.   Material Classification:      Zhongnuo provides Metal, Metal Oxides, Fluoride, Mixture, Other compound etc.   

Product	Sign	Purity	Form	Spec
High purity Hafnium Znongnuo	Hf	3N5, 4N	Sputtering targets	50.8*5mm etc
		3N5, 4N	Rod	Dia2*5mm
		3N5, 4N	Wire	Dia0.1-Dia5mm
		3N5, 4N	Sheet	0.03-10mm thickness
		3N5, 4N	Granules	1-5mm
		3N5, 4N	Powder	-200mesh etc

  Company Information   Zhongnuo is a manufacture dealing with high purity metals, good quality and high purity is always our advantage.     Zhongnuo specilizes in manufacture for all kinds of pure metals, evaporation sources and sputtering targets for use in both thermal and E-beam evaporation as well as sputter deposition processes. We offer pure elements, compounds, alloys, ceramics in a variety of shapes, sizes and purities for R&D applications. In addition, our sputter target bonding and precious metals reclamation services save our customers time and money. Customers can access MSDS and Material Certification Sheets from us for all materials. We are always ensuring your standards are met by meeting our own quality demands.   High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and Evaporation material. 
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5 
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR 
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X