Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

Titanium nitride for PVD thin film 99.99% High purity TiN target 99.99%

Basic Information
Specifications Titanium nitride for PVD thin film 99.99% High purity TiN target 99.99%

1. High density:90%

2. Low impurity content

Item Name

Titanium nitride for PVD thin film 99.99% High purity TiN target 99.99%

Purity

99.99%

Shape

Square/Round, According to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, the third test report

Technics

Hot Isostatic Pressing, Vacutln Sintering

Application

Widely used in coating processing industries

A: LCD, photoelectric devices field.

B: Electronic and semiconductor field.

C: Decoration and mould field.

Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
More > Other products from this company
Post Buying Request