Specifications high purity Titanium Nitride sputtering target TiN target

1.High corrosion and heat resistance

Item Name	high purity Titanium Nitride sputtering target   TiN target
Purity	99.99%
Shape	Square /round, according to your request
Available size	Round: dia 25~250mm Rectangular: length up to 1500mm Customization is available
Impurity content	Lower than 100ppm
Certificates	ISO9001:2008, SGS, the third test report
Technics	Powder metallurgy, Hot Isostatic Pressing
Application	Widely used in coating processing industries such as solar photovoltaic, IC and electronic electronics, solar cells and so on.
Advantage	High Hard texture Low impurity content Better heat dissipation High Tensile strength

         Company Information    ZNXC is a manufacture dealing with high purity metals, have long-term cooperation with most of domestic university and research institution in China. Good quality and high purity is always our advantage. ZNXC specilizes in manufacture for all kinds of pure metals, evaporation sources and sputtering targets for use in both thermal and E-beam evaporation as well as sputter deposition processes. We offer pure elements, compounds, alloys, ceramics in a variety of shapes, sizes and purities for R&D applications. In addition, our sputter target bonding and precious metals reclamation services save our customers time and money. Customers can access MSDS and Material Certification Sheets from us for all materials. We are always ensuring your standards are met by meeting our own quality demands.