high purity silicon sputtering target low resitivity silicon sputtering target   Product Description   Si sputtering target: Purity: 99.999% Color: black Grain size: SEM test Main application: produce transparency conductive electrode by vapor deposition Relative density: above 99% ( low pressure oxygen atmosphere sintering method)
Dimension: Largest single chip size of Si target which is used in TFT - LCD industry, large size can be spliced.     1.Supply Ability: to be produced as order 2.Good quality of goods, Competitive price 3.Fast feedback on your inquiries. 4.Trial order is acceptable before bulk ordering. 5.For longterm client, we could provide  free shipping cost or discount on price,etc.  

Item Name	Silicon sputtering target
Purity	99.999%
Shape	Square/Round, According to your request
Available size	Round: dia 25~300mm,Thickness:3~10mm Rectangular: Length up to 1500mm Customization is available
Certificates	ISO9001:2008, SGS, The third test report
Technics	Hot Isostatic Pressing,  Powder metallurgy
Application	Widely used in coating processing industries such as optics, solar photovoltaic, IC and electronic electronics, solar cells, flat panel display industry, magnetic, architectural and automotive glass coating and so on.    a: architectural glass, car using glass, graphic display field. b:electronic and semiconductor field. c:decoration and mould field.       d:advanced Packing Application
Advantage	High Hard texture Low impurity content Better heat dissipation High Tensile strength

 

  Our Services    Advantage:  Zhongnuo Si Sputtering targets provide customers with outstanding high-volume production capability combined with low operating costs required for today’s advanced chips.      Our Custom service:   Zhongnuo offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for you.
  Quality:       Microstructure                                                                  Performance     Electronic semiconductor, Recording media, Graphic display, Glass coating, Solar battery. Zhongnuo Cu target is widely used in coating processing industries A: Solar Photovoltaic Application. B: Electronic and Semiconductor Application. C: Decoration and Coating Application. etc. D:Magnetic Data Storage Application   Material Classification:    Zhongnuo provides Metal, Metal Oxides, Fluoride, Mixture, Other compound etc.    Company Information   Zhongnuo is a manufacture dealing with high purity metals, good quality and high purity is always our advantage.     Zhongnuo specilizes in manufacture for all kinds of pure metals, evaporation sources and sputtering targets for use in both thermal and E-beam evaporation as well as sputter deposition processes. We offer pure elements, compounds, alloys, ceramics in a variety of shapes, sizes and purities for R&D applications. In addition, our sputter target bonding and precious metals reclamation services save our customers time and money. Customers can access MSDS and Material Certification Sheets from us for all materials. We are always ensuring your standards are met by meeting our own quality demands.   High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and Evaporation material. 
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5 
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR 
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X   For more information: Skype: janice.guan2 Tele:+86 10 5603 7822 Phone: +86 180 01383341
www.znxc.cn