Specifications 1. Poly Silicon Sputtering Target 4n 5n 6n Si

2. Low impurity content

3. Microstructure: Uniform

4. Surface: Machine plane

  Product Description   Poly Silicon Sputtering Target 4n 5n 6n Si  

Item Name	Silicon sputteing target 99.9999% Pure silicon target 6N
Purity	99.99%, 99.999%, 99.9999%
Shape	Square /round, according to your request
Available size	Round: dia 25~300mm Rectangular: length up to 1500mm Customization is available
Impurity content	Low
Certificates	ISO9001:2008, SGS, the third test report
Technics	Powder metallurgy, Vacutln Sintering/HIP
Application	Widely used  in coating processing industries a: architectural glass, car using glass, graphic display field. b:electronic and semiconductor field. c:decoration and mould field.   d:optics coating materials
Advantage	High Hard texture Low impurity content Better heat dissipation High Tensile strength

    Our Services        Company Information   Zhongnuo Advanced Material (Beijing) Technology Co., Ltd. is a high-tech enterprise specialized in the production of high-purity metal, evaporation coating materials, and sputtering targets. "Professional, high quality and high efficiency" is our company's operation philosophy. Depending on high-quality products, professional services and a good business reputation, our company is a designated material supplier for many enterprises and scientific research institutes. Our Main Products:
High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and Evaporation material.
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X For more information:
Tele:+86 10 5288 1352
Fax:+86 10 6292 3013
Web:www.znxc.com