Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

High purity Tantalum sputtering target 99.99% 4N Ta target

Basic Information
Specifications High purity Tantalum sputtering target 99.99% 4N Ta target

1,High density :99%min

2,High corrosion resistance

3,High heat r

Item Name

High purity Tantalum sputtering target 99.99%  4N Ta target

Shape

Square/Round, according to your request

Available size

Round: dia 25~250mm

Rectangular: length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, the third test report

Technics

Powder metallurgy

Application

widely used in coating processing industries

a:Magnetic Data Storage field.

b:electronic and semiconductor field.

c:decoration and mould field.      

                    
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
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