Item Name

Ta sputtering target 99.99% tantalum sputtering target

Purity

99.95, 99.99%

Shape

Round/square target, according to your request

Available size

Round: dia 25~550mm,Thickness:3~30mm

Rectangular: Length up to 2000mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Hot Isostatic Pressing (HIP), Powder Metallurgy, Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Magnetic Data Storage Application

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc.

 Advantages

Microstructure: Uniform equiaxed fine grain, consistent microstructure, average grain size <100μm

Detailed information

Tantalum can be used to make evaporation containers, tube electrodes, rectifier, electrolysis, capacitance and mend destroyed tissue by sheet or fine wire tantalum in medical treatment.

Tantalum is also the production material of electronic tubes, high-power electron tube parts. Tantalum corrosion-resistant equipment is used for the production of strong acid, bromine, ammonia and other chemical industry. Metal tantalum can be used for structural materials for aircraft engine combustion chamber. Tantalum tungsten alloy, tantalum tungsten hafnium alloy and tantalum hafnium alloy can be used as heat-resistant high-strength materials for rockets, missiles and jet engines, as well as control and regulating equipment parts etc.

 Quality Standard (99.99% Ta)

Element

Value(≤Ppm)

Element

Value(≤Ppm)

Element

Value(≤Ppm)

Nb

3

Ni

0.5

Ti

0. 5

O

10

Zr

1

Mn

0. 5

N

3

Cr

0. 5

Al

0. 5

C

5

W

1

H

2

Si

0. 5

Mo

1

Fe

2

Cu

0. 5