Manufacture High qurity 99.99% dia 50.8*3mm Tantalum(Ta) sputtering target   Product Description   

Item Name	High purity Tantalum sputtering target 99.99%    tantalum target
Purity	99.99%
Shape	according to your request
Available size	Round: dia 25~300mm,Thickness:3~10mm Rectangular: Length up to 1500mm Customization is available
Certificates	ISO9001:2008, SGS,The third test report
Technics	Hot IsostaticPressing (HIP)
Application	Widely used in coating processing industries A: Magnetic Data Storage Application B: Electronic and Semiconductor Appication. C: Decoration and Coating Appication. etc.

Quality Standard (99.99% Ta)
Element	Value(≤Ppm)	Element	Value(≤Ppm)	Element	Value(≤Ppm)
Nb	3	Ni	0.5	Ti	0. 5
O	10	Zr	1	Mn	0. 5
N	3	Cr	0. 5	Al	0. 5
C	5	W	1	H	2
Si	0. 5	Mo	1
Fe	2	Cu	0. 5

      Product Picture         Certifications   Our team   Company Information   Zhongnuo Advanced Material (Beijing) Technology Co., Ltd. is a high-tech enterprise specialized in the production of high-purity metal, evaporation coating materials, and sputtering targets. "Professional, high quality and high efficiency" is our company's operation philosophy. Depending on high-quality products, professional services and a good business reputation, our company is a designated material supplier for many enterprises and scientific research institutes. Our Main Products:
High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and Evaporation material.
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X For more information:
Tele:+86 10 5288 1352
Fax:+86 10 6292 3013
Web:www.znxc.com       Hot Products