Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.

Chromium Titanium alloy target for sputtering TiCr sputtering target

Basic Information
Specifications Chromium Titanium alloy target for sputtering TiCr sputtering target

1,High density :99.9%,min

Item Name

Chromium Titanium alloy target for sputtering   TiCr sputtering target

Purity

99.9%,99.99%

Shape

Square /round, according to your request

Available size

Round: dia 25~250mm

Rectangular: length up to 1500mm

Customization is available

Proportion(wt%)

5-80 ± 0.2Cr  at your request.

Impurity content

lower than 100ppm

Certificates

ISO9001:2008, SGS, the third test report

Technics

Vacuum melting

Application

widely used in coating processing industries

a: architectural glass, car using glass, graphic display field.

b:electronic and semiconductor field.

c:decoration and mould field.    

Advantage

High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength 

 
Supplier Information
Zhongnuo Advanced Material (Beijing) Technology Co., Ltd.
[ Beijing China ]
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