Titanium Nitride (TiN) Sputtering Targets Product Description    

Item Name	Titanium Nitride sputtering target 99.99%   TiN ceramic target
Purity	99.99%
Shape	Square /round, according to your request
Available size	Round: dia 25~250mm Rectangular: length up to 1500mm Customization is available
Impurity content	Lower than 100ppm
Certificates	ISO9001:2008, SGS, the third test report
Technics	Powder metallurgy
Application	Widely used in coating processing industries such as solar photovoltaic, IC and electronic electronics, solar cells and so on.
Advantage	High Hard texture Low impurity content Better heat dissipation High Tensile strength

      Company Information   Zhongnuo Advanced Material (Beijing) Technology Co., Ltd. is a high-tech enterprise specialized in the production of high-purity metal, evaporation coating materials, and sputtering targets. "Professional, high quality and high efficiency" is our company's operation philosophy. Depending on high-quality products, professional services and a good business reputation, our company is a designated material supplier for many enterprises and scientific research institutes.   Our Main Products:
High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and Evaporation material.
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X   For more information:   Janice Guan Zhongnuo Advanced Material (Beijing) Technology Co., Ltd
Skype: janice.guan2Tele:+86 10 5603 7822 Phone: +86 180 01383341
www.znxc.cn