Specifications 1. High density: 99%
2. Low impurity content
3. Microstructure: Uniform
4. Surface: Machine plane/Polished
5. ISO9001: 2008
Product Description
Item Name | Tin sputtering targets 99.9999% Pure Tin sputtering deposition 99.9999 |
Purity | 99.999%~99.9999% |
Shape | Flat/rotary target, according to your request |
Available size | Round: dia 25~300mm,Thickness:3~10mm Rectangular: Length up to 1500mm Customization is available |
Certificates | ISO9001:2008, SGS, the third test report |
Technics | Vacuum Melting, Patented thermo-mechanical process |
Application | Widely used in coating processing industries A: Solar Photovoltaic Appication. B: Electronic and Semiconductor Appication. C: Decoration and Coating Appication. etc. |
Our Services
Quality Standard (99.999% Sn) |
Element | Value(≤ppm) | Element | Value(≤ppm) |
Cu | 0.5 | In | 0.1 |
Ag | 0.5 | Ca | 0.5 |
Mg | 0.5 | Fe | 0.5 |
Sb | 0.5 | Au | 0.1 |
Ni | 0.5 | Zn | 0.5 |
Co | 0.1 | Al | 0.1 |
Bi | 0.5 | Pb | 1 |
Company Information Zhongnuo Advanced Material (Beijing) Technology Co., Ltd. is a high-tech enterprise specialized in the production
of high-purity metal, evaporation coating materials, and sputtering targets. "Professional, high quality and high
efficiency" is our company's operation philosophy. Depending on high-quality products, professional services and a
good business reputation, our company is a designated material supplier for many enterprises and scientific
research institutes. Our Main Products:
High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W
targets and Evaporation material.
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X