Item Name

High purity silicon dioxide sputtering target 99.99%   silicon dioxide target for film coating

Purity

99.99%, 99.999%  

Shape

Square /round, according to your request

Available size

Round: dia 25~250mm

Rectangular: length up to 1500mm

Customization is available

Impurity content

Lower than 100ppm

Certificates

ISO9001:2008, SGS, the third test report

Technics

Powder metallurgy

Application

Widely used in coating processing industries such as

optical data storage, solar photovoltaic, IC and electronic electronics, solar cells, flat panel display industry and so on. 

Advantage

High Hard texture

Low impurity content

Better heat dissipation

High Tensile strength